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Rezal Khairi Ahmad |
NanoMalaysia Berhad |
Malaysia |
Invited |
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Laura Armiento |
Grafoid Inc. |
Canada |
Invited |
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Terrance Barkan |
The Graphene Council |
USA |
Invited |
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Siva Böhm |
Talga Technologies Ltd |
UK |
Invited |
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Paolo Bondavalli |
Thales Research & Technology |
France |
Invited |
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Vincent Bouchiat |
Institut Néel, CNRS-Grenoble |
France |
Invited |
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Alba Centeno |
Graphenea |
Spain |
Invited |
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Marc Chaigneau |
HORIBA FRANCE SAS |
France |
Invited |
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Seungmin Cho |
MCK TECH Co. Ltd. |
South Korea |
Invited |
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Camilla Coletti |
IIT |
Italy |
Invited |
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Costas Galiotis |
FORTH/ ICE-HT and University of Patras |
Greece |
Invited |
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Khasha Ghaffarzadeh |
IDTechEx |
UK |
Invited |
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Julio Gómez |
Avanzare |
Spain |
Invited |
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Stijn Goossens |
ICFO - The Institute of Photonic Sciences |
Spain |
Invited |
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Kari Hjelt |
Chalmers Industrial Technic |
Sweden |
Invited |
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Cedric Huyghebaert |
IMEC |
Belgium |
Invited |
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Yukio Kawano |
Tokyo Insitute of Technology |
Japan |
Invited |
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Tae Hyeong Kim |
LG Electronics |
Korea |
Invited |
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Joung Hoon Lee |
Standard Graphene |
South Korea |
Invited |
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Martin R. Lohe |
Sixonia / TUDresden
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Germany |
Invited |
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Minyang Lu |
CGIA |
China |
Invited |
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Mindaugas Lukosius |
Institute for High Performance Microelectronics |
Germany |
Invited |
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Julia Messner |
Carbon Waters |
France |
Invited |
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Daniel Neumaier |
AMO GmbH |
Germany |
Invited |
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Vincenzo Palermo |
CNR-ISOF |
Italy |
Invited |
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Iwona Pasternak |
ENT and WUT |
Poland |
Invited |
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Wencai Ren |
Chinese Academy of Sciences |
China |
Invited |
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Shintaro Sato |
Fujitsu Laboratories Ltd. |
Japan |
Invited |
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Emmanuel Stratakis |
FORTH |
Greece |
Invited |
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Aravind Vijayaraghavan |
The University of Manchester |
UK |
Invited |
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Helge Weman |
CrayoNano AS |
Norway |
Invited |
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Rune Wendelbo |
Abalonyx |
Norway |
Invited |
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