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Following the success of last year edition, the INDUSTRIAL FORUM will keep the 2 days format and will present the most recent advances in technology developments and business opportunities in graphene commercialization. Key representatives of “graphene companies” will share their market vision and business opportunities, while selected talks from industrial exhibitors will present commercial showcases in all current market fields of graphene products.

The INDUSTRIAL FORUM will be focusing on: latest developments in graphene production methods towards wide scale commercialization, emerging opportunities for graphene-based materials, determining criteria for graphene investment opportunities, revealing the latest updates on the application of graphene in electronics, application and commercialization of graphene-based materials in energy storage, aerospace & barrier applications.


If you already have a Conference or Exhibition Pass, attendance to the industrial Forum is included.

Industrial Forum Chairs:
Luigi Colombo The University of Texas at Dallas (USA), Francesco Bonaccorso IIT / Bedimensional (Italy) and Ken Teo AIXTRON (UK)
Co-chairs: Aldo di Carlo University of Rome Tor Vergata (Italy), Xinliang Feng TU-Dresden (Germany) and Yichun Li CGIA (China)

  Keynotes/Invited Industrial Forum
 
Andrea Ferrari
Cambridge Graphene Centre, University of Cambridge
UK
Keynote
Seongjun Park
Samsung Advanced Institute of Technology
South Korea
Keynote
 
 
Rezal Khairi Ahmad
NanoMalaysia Berhad
Malaysia
Invited
Laura Armiento
Grafoid Inc.
Canada
Invited
Terrance Barkan
The Graphene Council
USA
Invited
Siva Böhm
Talga Technologies Ltd
UK
Invited
Paolo Bondavalli
Thales Research & Technology
France
Invited
Vincent Bouchiat
Institut Néel, CNRS-Grenoble
France
Invited
 
Alba Centeno
Graphenea
Spain
Invited
Marc Chaigneau
HORIBA FRANCE SAS
France
Invited
Seungmin Cho
MCK TECH Co. Ltd.
South Korea
Invited
Camilla Coletti
IIT
Italy
Invited
Costas Galiotis
FORTH/ ICE-HT and University of Patras
Greece
Invited
Khasha Ghaffarzadeh
IDTechEx
UK
Invited
 
Julio Gómez
Avanzare
Spain
Invited
Stijn Goossens
ICFO - The Institute of Photonic Sciences
Spain
Invited
Kari Hjelt
Chalmers Industrial Technic
Sweden
Invited
Cedric Huyghebaert
IMEC
Belgium
Invited
Yukio Kawano
Tokyo Insitute of Technology
Japan
Invited
Tae Hyeong Kim
LG Electronics
Korea
Invited
 
Joung Hoon Lee
Standard Graphene
South Korea
Invited
Martin R. Lohe
Sixonia / TUDresden
Germany
Invited
Minyang Lu
CGIA
China
Invited
Mindaugas Lukosius
Institute for High Performance Microelectronics
Germany
Invited
Julia Messner
Carbon Waters
France
Invited
Daniel Neumaier
AMO GmbH
Germany
Invited
 
Vincenzo Palermo
CNR-ISOF
Italy
Invited
Iwona Pasternak
ENT and WUT
Poland
Invited
Wencai Ren
Chinese Academy of Sciences
China
Invited
Shintaro Sato
Fujitsu Laboratories Ltd.
Japan
Invited
Emmanuel Stratakis
FORTH
Greece
Invited
Aravind Vijayaraghavan
The University of Manchester
UK
Invited
 
Helge Weman
CrayoNano AS
Norway
Invited
Rune Wendelbo
Abalonyx
Norway
Invited